Electrospun Poly(琯-caprolactone)/Gelatin Nanofibrous Mat Containing Selenium as a Potential Wound Dressing Material: In Vitro and In Vivo Study 


Vol. 21,  No. 8, pp. 1713-1721, Aug.  2020
10.1007/s12221-020-9825-8


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  Abstract

In the current study, selenium particles were loaded into poly(琯-caprolactone)/gelatin nanofibrous matrices in order to fabricate a potential wound dressing. The mats were produced by electrospinning of poly(琯-caprolactone)/Gelatin (1:1 (w/w)) solution supplemented with 1 and 10 % (w/v) of selenium particles. Prepared wound dressings were investigated regarding their morphology, mechanical properties, surface wettability, water-uptake capacity, water vapor permeability, porosity, blood compatibility, microbial penetration test and cellular response. Dressings containing 1 % and 10 % selenium and selenium free mats were chosen to treat the full-thickness excisional wounds in Wistar rats. The study revealed that after 14 days, the wound closure of the mat containing 1 % selenium was about 95.5짹6.38 % while wound closure of the negative control group was about 48.83짹4.03 %. Our results showed the capability of nanofibrous containing selenium for successful wound treatment.

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  Cite this article

[IEEE Style]

M. Salehi, K. Shahporzadeh, A. Ehterami, H. Yeganehfard, H. Ziaei, M. M. Azizi, S. Farzamfar, A. Tahersoltani, A. Goodarzi, J. Ai, A. Ahmadi, "Electrospun Poly(琯-caprolactone)/Gelatin Nanofibrous Mat Containing Selenium as a Potential Wound Dressing Material: In Vitro and In Vivo Study," Fibers and Polymers, vol. 21, no. 8, pp. 1713-1721, 2020. DOI: 10.1007/s12221-020-9825-8.

[ACM Style]

Majid Salehi, Keyvan Shahporzadeh, Arian Ehterami, Hodays Yeganehfard, Heliya Ziaei, Mohammad Moein Azizi, Saeed Farzamfar, Amirreza Tahersoltani, Arash Goodarzi, Jafar Ai, and Akbar Ahmadi. 2020. Electrospun Poly(琯-caprolactone)/Gelatin Nanofibrous Mat Containing Selenium as a Potential Wound Dressing Material: In Vitro and In Vivo Study. Fibers and Polymers, 21, 8, (2020), 1713-1721. DOI: 10.1007/s12221-020-9825-8.

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pISSN : 1229 - 9197
eISSN : 1875 - 0052

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