Review on the Process Safety of SiH4 Gas used in Semiconductor and FPD Field
Vol. 22, No. 4, pp. 32-36, Aug. 2007
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Cite this article
[IEEE Style]
김중조 and , "Review on the Process Safety of SiH4 Gas used in Semiconductor and FPD Field," Journal of the Korean Society of Safety, vol. 22, no. 4, pp. 32-36, 2007. DOI: .
[ACM Style]
김중조 and 김 홍. 2007. Review on the Process Safety of SiH4 Gas used in Semiconductor and FPD Field. Journal of the Korean Society of Safety, 22, 4, (2007), 32-36. DOI: .