Optimization of CMP Filter Layered Structure for Slurry Filtration of Less than 1 Micron
Vol. 60, No. 5, pp. 313-320, Oct. 2023
10.12772/TSE.2023.60.313
Abstract
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Cite this article
[IEEE Style]
H. Chae, K. Kim, S. Kim, "Optimization of CMP Filter Layered Structure for Slurry Filtration of Less than 1 Micron," Textile Science and Engineering, vol. 60, no. 5, pp. 313-320, 2023. DOI: 10.12772/TSE.2023.60.313.
[ACM Style]
Hyo-Jung Chae, Kyung-Do Kim, and Sam-Soo Kim. 2023. Optimization of CMP Filter Layered Structure for Slurry Filtration of Less than 1 Micron. Textile Science and Engineering, 60, 5, (2023), 313-320. DOI: 10.12772/TSE.2023.60.313.