Risk Assessment for Indoor Devices in a Semiconductor FAB using CFD 


Vol. 40,  No. 5, pp. 146-153, Oct.  2025
10.14341/JKOSOS.2025.40.5.146


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  Abstract

Risk assessment models for existing PSM systems are primarily geared toward outdoor facilities, but not as much toward indoor spaces such as fabs - clean rooms for semiconductor manufacturing that feature a cluster, which is a semiconductor production device. This study evaluated the risk associated with the leakage of hazardous substances in the cluster by performing simulations with FLACS-CFD v22.2, a CFD program. The results indicate that, in the worst-case scenario, leaks of major hazardous substances such as H2 and NH3 are limited to the G/B neighborhood and do not spread to neighboring clusters or spaces. Additionally, among the mass flow controller, local exhaust system, and building ventilation system, the local exhaust system and building ventilation system have the greatest and least influence, respectively, on the diffusion of hazardous substances.

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  Cite this article

[IEEE Style]

장서일 and 함병호, "Risk Assessment for Indoor Devices in a Semiconductor FAB using CFD," Journal of the Korean Society of Safety, vol. 40, no. 5, pp. 146-153, 2025. DOI: 10.14341/JKOSOS.2025.40.5.146.

[ACM Style]

장서일 and 함병호. 2025. Risk Assessment for Indoor Devices in a Semiconductor FAB using CFD. Journal of the Korean Society of Safety, 40, 5, (2025), 146-153. DOI: 10.14341/JKOSOS.2025.40.5.146.

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