Novel Transfer-Printing Process for Block Copolymer Nanopatterns Using Chemically Modified Graphene

Among the various transfer-printing processes, a simple and primitive technique involves retrieving ultrathin nanomaterials, such as polymers, 2D materials, and quantum dots, floating on the surface of a liquid. In particular, this method has significant limitations as it is largely affected by the surface energy of a receiver substrate and inevitably generates numerous wrinkles during the printing process. In this work, we investigate a novel transfer-printing process for metal nanopattern arrays on chemically modified graphene (CMG) films using a block copolymer (BCP) nanotemplate and polydimethylsiloxane (PDMS) stamp. A metal nanopattern array fabricated with BCP lithography on a CMG film was thus successfully transferred to nonplanar (i.e., rough or curved) surfaces.

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Novel Transfer-Printing Process for Block Copolymer Nanopatterns Using Chemically Modified Graphene

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